High vacuum multi-target magnetron sputtering coating machine

Model: JCP350

Function：JCP350 high vacuum multi-target magnetron sputtering coater has dc and RF power supply. Dc magnetron sputtering is suitable for sputtering conductor target deposition coating, such as metal target, which is characterized by relatively fast. Rf magnetron sputtering is suitable for sputtering conductor semiconductor and insulating target coating, such as oxide target.